ASML VS X-ray radiation?
To harness the power of extreme ultraviolet light and bring EUV lithography to market, $ASML Holding(ASML.US$ has continued to invest in research and development for more than 20 years to meet the difficult technical challenges that continue to arise, and it is now the core equipment for advanced foundries around the world. Companies such as $Taiwan Semiconductor(TSM.US$ , $SAMSUNG EL 144(SSNGY.US$ and $Intel(INTC.US$ are competing for these lithography machines for the development of their own chips, but some countries on the Advanced Technology Sanctions List are not allowed to purchase these products, such as Russia.
ASML developed the lithography machine is extreme ultraviolet (EUV), wavelength of 13.5 nm, while Russia plans to develop the lithography machine X-ray technology wavelength between 0.01 nm to 10 nm, shorter than the EUV extreme ultraviolet light, so the lithography resolution is much higher.
Because of these two features, the Russian X-ray lithography to be developed has a great advantage, and is even advertised by the local media as a lithography machine that is not available worldwide, and ASML can not do.
Russian research on lithography technology dates back to the mid-1980s, when Russia began developing a synchrotron X-ray radiation source. This technology was apparently developed by visionary scientists to meet the needs of microelectronic processing, but the plans were not implemented.
With all this in mind, Russia's X-ray lithography program actually seems unlikely. However, it may provide some valuable contributions to the science of semiconductor manufacturing.
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